Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3373587
Reference47 articles.
1. Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
2. Delocalizing strain in a thin metal film on a polymer substrate
3. Plasma modification of polymer surfaces for adhesion improvement
4. Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation
5. Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation
Cited by 96 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness;Journal of Vacuum Science & Technology B;2024-07-01
2. Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification;Microsystems & Nanoengineering;2024-02-23
3. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process;Journal of Vacuum Science & Technology B;2023-10-31
4. EFFECTS OF EDGE ROUGHNESS ON SURFACE CHARGING IN PLASMA ETCHING;Surface Review and Letters;2023-08-26
5. The modification of roughness to corner effect in plasma etching;Physica Scripta;2023-07-18
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3