Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography-Reference-Cited by-同舟云学术

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Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography

Published:2001-09 Issue:5 Volume:45 Page:683-695
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Ito H.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389064/05389068.pdf?arnumber=5389068

Cited by 64 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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