Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2912028
Reference23 articles.
1. Deposition control for reduction of 193 nm photoresist degradation in dielectric etching
2. Sub-0.1 μm nitride hard mask open process without precuring the ArF photoresist
3. Effects of various plasma pretreatments on 193 nm photoresist and linewidth roughness after etching
4. Line edge roughness reduction by plasma curing photoresists
5. Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfaces
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