Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfaces-Reference-Cited by-同舟云学术

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Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfaces

Published:2004-11 Issue:6 Volume:22 Page:2508-2516
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kimura Yoshie,Coburn J. W.,Graves David B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1810166

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Plasma chemical etching of high-aspect-ratio silicon micro- and nanostructures;Russian Journal of General Chemistry;2015-05

4. In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-05

5. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces;Review of Scientific Instruments;2013-10

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