Plasma potential profile in a 2.45 GHz electron cyclotron resonance multicharged ion source
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1148658
Reference4 articles.
1. A classical model of ion confinement and losses in ECR ion sources
2. Modelling for Production of Multicharged Ions in ECR Source
3. Plasma potentials and performance of the advanced electron cyclotron resonance ion source
4. Improvement of an ECR multicharged ion source
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1. Cutoff limitation of left-hand polarization wave and candidates for further enhanced producing multicharged ions on ECRIS;Journal of Physics: Conference Series;2022-04-01
2. Formation of multi-charged ion beams by focusing effect of mid-electrode on electron cyclotron resonance ion source;Review of Scientific Instruments;2014-02
3. Profiles of ion beams and plasma parameters on a multi-frequencies microwaves large bore electron cyclotron resonance ion source with permanent magnets;Review of Scientific Instruments;2012-02
4. Plasma potential measurement in 2.45GHz electron cyclotron resonance plasma with a magnetron magnetic field configuration;Thin Solid Films;2010-09
5. Production of electron cyclotron resonance plasma by using multifrequencies microwaves and active beam profile control on a large bore electron cyclotron resonance ion source with permanent magnets;Review of Scientific Instruments;2010-02
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