Production of electron cyclotron resonance plasma by using multifrequencies microwaves and active beam profile control on a large bore electron cyclotron resonance ion source with permanent magnets-Reference-Cited by-同舟云学术

Production of electron cyclotron resonance plasma by using multifrequencies microwaves and active beam profile control on a large bore electron cyclotron resonance ion source with permanent magnets

Published:2010-02 Issue:2 Volume:81 Page:02A313
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Kato Yushi,Watanabe Takeyoshi,Matsui Yuuki,Hirai Yoshiaki,Kutsumi Osamu,Sakamoto Naoki,Sato Fuminobu,Iida Toshiyuki

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3277195

Reference6 articles.

1. 11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing

2. Effects of fundamental and second harmonic electron cyclotron resonances on ECRIS

3. Ion Beam Extraction from Large Bore 11 to 13 GHz ECR Ion Source with a Pair of Cylindrically Comb-Shaped Magnetic Fields

4. Plasma potential profile in a 2.45 GHz electron cyclotron resonance multicharged ion source

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