11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2387885
Reference22 articles.
1. Damage during SiO2 Etching by Low-Angle Forward Reflected Neutral Beam
2. Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH4/H2/Ar and O2
3. Production of multicharged ions in a 2.45 GHz electron cyclotron resonance source directly excited in a circular TE01 mode cavity resonator
4. ECR multi-charged ion source directly excited in a circular TE01 mode cavity resonator
5. An ECR ion source directly excited in a selected microwave mode cavity resonator for material processing
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1. First results of the 2.45 GHz Oshima electron cyclotron resonance ion source;Review of Scientific Instruments;2016-02
2. First operation and effect of a new tandem-type ion source based on electron cyclotron resonance;Review of Scientific Instruments;2016-02
3. New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams;Review of Scientific Instruments;2014-02
4. Design of a new electron cyclotron resonance ion source at Oshima National College of Maritime Technology;Review of Scientific Instruments;2014-02
5. Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current;Review of Scientific Instruments;2014-02
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