Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3503278
Reference26 articles.
1. Antireflecting coating from Ta2O5 and SiO2 multilayer films
2. Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films
3. Reactively sputtered tantalum pentoxide thin films for integrated capacitors
4. Evanescent field Sensors Based on Tantalum Pentoxide Waveguides – A Review
5. Optical and durability properties of infrared transmitting thin films
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2. NANOSTRUCTURED Ti-C THIN FILMS DEPOSITED BY THERMIONIC VACUUM ARC (TVA) TECHNOLOGY;Annals of the Academy of Romanian Scientists Series on Physics and Chemistry;2022
3. New Volatile Tantalum Imido Precursors with Carboxamide Ligands;ACS Omega;2021-09-16
4. Magnesium-silver cathodes for efficient charge injection into Organic Light Emitting Diodes deposited by LTVA method;Journal of Alloys and Compounds;2021-07
5. Deposition of cadmium (II) oxide-reinforced VP glassy thin films by thermionic vacuum arc (TVA) and structural characterization;Journal of Materials Science: Materials in Electronics;2021-05-20
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