Plasma enhanced chemical vapor deposition and characterization of boron nitride gate insulators on InP
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349118
Reference28 articles.
1. InP MISFET Technology: Interface Considerations
2. Interface Properties of InP ‐ Dielectric Systems
3. Thin Film Boron Nitride for Semiconductor Application
4. Synthetic routes to boron nitride
5. Amorphous BN films produced in a double-plasma reactor for semiconductor applications
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