Amorphous BN films produced in a double-plasma reactor for semiconductor applications
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. III–V Semiconducting Compounds;Neuberger,1971
2. Properties of BN films produced by a low-temperature double-plasma process
3. Plasmachemie;Drost,1978
4. Perkin-Elmer, φ-Atlas.
5. The Chemical Deposition of Boron‐Nitrogen Films
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