The effect of radio frequency plasma processing reactor circuitry on plasma characteristics
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.367326
Reference23 articles.
1. Electrical isolation of radio‐frequency plasma discharges
2. Current and Voltage Measurements in the Gaseous Electronics Conference Rf Reference Cell
3. Electrical Properties of RF Sputtering Systems
4. Plasma parameter estimation from rf impedance measurements in a dry etching system
5. Electrical properties of planar rf discharges for dry etching
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