Ion bombardment in rf plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346278
Reference35 articles.
1. Phenomena produced by ion bombardment in plasma‐assisted etching environments
2. Ion-enhanced gas-surface chemistry: The influence of the mass of the incident ion
3. Chemical sputtering of fluorinated silicon
4. Chemically enhanced ion etching on refractory metal silicides
5. Sputtering of SiO2 in a XeF2 and in a Cl2 atmosphere
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