Study on the effect of ion beam bombardment during deposition on preferred orientation in rutile-type titanium dioxide films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.367164
Reference9 articles.
1. Use of ion beam assisted deposition to modify the microstructure and properties of thin films
2. Growth of thin films with preferential crystallographic orientation by ion bombardment during deposition
3. Microstructure of sputtered metal films grown in high‐ and low‐pressure discharges
4. Ion-beam-induced texture formation in vacuum-condensed thin metal films
5. Variation of crystallization with arrival ratio in titanium nitride films formed by dynamic mixing method
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