Optical characterization of stress in narrow GaAs stripes on patterned Si substrates
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101894
Reference14 articles.
1. Significant improvement in crystalline quality of molecular beam epitaxially grown GaAs on Si (100) by rapid thermal annealing
2. Significant improvement in crystalline quality of molecular beam epitaxially grown GaAs on Si (100) by rapid thermal annealing
3. Optical and structural properties of GaAs grown on (100) Si by molecular‐beam epitaxy
4. Stress variations due to microcracks in GaAs grown on Si
5. Stress variations and relief in patterned GaAs grown on mismatched substrates
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1. Stability of dislocations in epitaxially strained semiconductor stripe films;Semiconductor Science and Technology;1996-09-01
2. Stresses and strains in lattice‐mismatched stripes, quantum wires, quantum dots, and substrates in Si technology;Journal of Applied Physics;1996-06
3. Stresses and strains in epilayers, stripes and quantum structures of III - V compound semiconductors;Semiconductor Science and Technology;1996-05-01
4. Two‐dimensional finite‐element calculation of stress and strain in a stripe epilayer and substrate;Philosophical Magazine A;1995-04
5. Strain, dislocations, and critical dimensions of laterally small lattice‐mismatched semiconductor layers;Journal of Applied Physics;1995-03
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