Inductively coupled plasma etching of GaN-Reference-Cited by-同舟云学术

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Inductively coupled plasma etching of GaN

Published:1996-08-19 Issue:8 Volume:69 Page:1119-1121
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Shul R. J.,McClellan G. B.,Casalnuovo S. A.,Rieger D. J.,Pearton S. J.,Constantine C.,Barratt C.,Karlicek R. F.,Tran C.,Schurman M.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.117077

Reference17 articles.

Cited by 207 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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