Ιn situ N2-NH3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD-Reference-Cited by-同舟云学术

Ιn situ N2-NH3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD

Published:2019-09-28 Issue:12 Volume:126 Page:125305
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Gakis Georgios P.¹²,Vergnes Hugues²^ORCID,Cristiano Fuccio³,Tison Yann⁴^ORCID,Vahlas Constantin⁵^ORCID,Caussat Brigitte²^ORCID,Boudouvis Andreas G.¹,Scheid Emmanuel³^ORCID

Affiliation:

1. School of Chemical Engineering, National Technical University of Athens, Heroon Polytechneiou 9, 15780 Zografou, Athens, Greece

2. Laboratoire de Génie Chimique, Université de Toulouse, 4 allée Emile Monso, 31030 Toulouse cedex 4, France

3. LAAS, Université de Toulouse, 7 avenue du Colonel Roche, 31031 Toulouse, France

4. IPREM, Université de Pau et des Pays de l’Adour, Hélioparc Pau-Pyrénées, 2 Avenue du Président Angot, 64053 Pau Cedex 9, France

5. CIRIMAT, Université de Toulouse, 4 allée Emile Monso, 31030 Toulouse cedex 4, France

Funder

Toulouse Tech Inter Lab

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5113755

Reference36 articles.

1. A brief review of atomic layer deposition: from fundamentals to applications

2. Atomic Layer Deposition: An Overview

3. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

4. Angle-resolved x-ray photoelectron spectroscopy of ultrathin Al[sub 2]O[sub 3] films grown by atomic layer deposition

5. Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Towards a mechanistic understanding of the floating catalyst CVD of CNTs: Interplay between catalyst particle nucleation, growth and deactivation;Chemical Engineering Science;2024-08

2. Metal and metal oxide nanoparticle toxicity: moving towards a more holistic structure–activity approach;Environmental Science: Nano;2023

3. A structure–activity approach towards the toxicity assessment of multicomponent metal oxide nanomaterials;Nanoscale;2023

4. Influence of the Cl₂ etching on the Al₂O₃/GaN metal–oxide–semiconductor interface;Journal of Vacuum Science & Technology B;2022-12

5. Shedding light on the initial growth of ZnO during plasma-enhanced atomic layer deposition on vapor-deposited polymer thin films;Applied Surface Science;2022-12