Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3103254
Reference63 articles.
1. Toughening of hard nanostructural thin films: a critical review
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5. Ultra-Low Thermal Conductivity in W/Al 2 O 3 Nanolaminates
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