Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study
Author:
Affiliation:
1. Department of Physics and NTIS – European Centre of Excellence, University of West Bohemia, Univerzitní 8, 30614 Plzeň, Czech Republic
Funder
Grantová Agentura České Republiky (GACR)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4996186
Reference21 articles.
1. D. Depla and S. Mahieu , Reactive Sputter Deposition, Springer Series in Materials Science Vol. 109, edited by D. Depla and S. Mahieu ( Springer, Berlin, Heidelberg, 2008), p. 590.
2. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
3. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
4. An introduction to thin film processing using high-power impulse magnetron sputtering
5. Hysteresis-free deposition of niobium oxide films by HiPIMS using different pulse management strategies
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