Hysteresis-free deposition of niobium oxide films by HiPIMS using different pulse management strategies-Reference-Cited by-同舟云学术

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Hysteresis-free deposition of niobium oxide films by HiPIMS using different pulse management strategies

Published:2012-01-20 Issue:5 Volume:45 Page:055204
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Hála M,Čapek J,Zabeida O,Klemberg-Sapieha J E,Martinu L

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference55 articles.

1. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

2. High power pulsed magnetron sputtered CrN films

3. Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering

4. Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology

5. Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

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1. Commissioning of a modulated pulse-power magnetron sputtering system for depositing niobium thin films;Vacuum;2024-11

2. Commissioning of a Modulated Pulse-Power Magnetron Sputtering System for Depositing Niobium Thin Films;2024

3. High-Power Impulse Magnetron Sputter-Deposited Chromium-Based Coatings for Corrosion Protection;Coatings;2023-12-18

4. In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature;Thin Solid Films;2023-11

5. Dynamics of sputtered particles in multipulse HiPIMS discharge;Plasma Sources Science and Technology;2023-04-01

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