Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors II: Modeling of the spatial dependence of expanded plasma parameters and species number densities-Reference-Cited by-同舟云学术

Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors II: Modeling of the spatial dependence of expanded plasma parameters and species number densities

Published:2007-09-15 Issue:6 Volume:102 Page:063310
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Mankelevich Yu. A.,Ashfold M. N. R.,Orr-Ewing A. J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2783891

Reference23 articles.

1. Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities

2. Measurements of C2 and CH concentrations and temperatures in a dc arc jet using cavity ring-down spectroscopy

3. Chemical kinetics in carbon depositing d.c.-arc jet CVD reactors

4. Number density and temperature of acetylene in hot-filament and arc-jet activated CH4/H2 gas mixtures measured using diode laser cavity ring-down absorption spectroscopy

5. Cavity ring-down spectroscopy measurements of the concentrations of C2(X1Σg+) radicals in a DC arc jet reactor used for chemical vapour deposition of diamond films

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