Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities-Reference-Cited by-同舟云学术

Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities

Published:2007-09-15 Issue:6 Volume:102 Page:063309
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Rennick C. J.,Ma J.,Henney J. J.,Wills J. B.,Ashfold M. N. R.,Orr-Ewing A. J.,Mankelevich Yu. A.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2783890

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1. Low-Pressure Synthetic Diamond

2. Diamond thin films: a 21st-century material

3. Spatial density distributions of C2, C3, and CH radicals by laser-induced fluorescence in a diamond depositing dc-arcjet

4. Absolute concentration, temperature, and velocity measurements in a diamond depositing dc-arcjet reactor

5. Flow characterization of a diamond-depositing dc arcjet by laser-induced fluorescence

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