Ultrafast Deposition of Diamond by Plasma-Enhanced CVD-Reference-Cited by-同舟云学术

Ultrafast Deposition of Diamond by Plasma-Enhanced CVD

Published:2014 Issue: Volume: Page:217-268
ISSN:
Container-title:Comprehensive Hard Materials
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Author:

Gicquel Alix,Silva François,Rond Catherine,Derkaoui Nadira,Brinza Ovidiu,Achard Jocelyn,Lombardi Guillaume,Tallaire Alexandre,Michau Armelle,Wartel Maxime,Hassouni Khaled

Publisher

Elsevier

Reference207 articles.

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3. Detection of CH3 radicals in an RF CH4/H2 plasma by photoionization mass spectrometry;Ando;Vacuum,1998

4. Development of low pressure diamond growth in the united states;Angus,1994

5. Chemical vapour deposition of diamond;Angus;Philosophical Transactions: Physical Sciences and Engineering,1993

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