Multicharged iron ions produced by using induction heating vapor source
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Reference10 articles.
1. Formation of β-FeSi2 by implanting multicharged iron ions produced in an ECR ion source
2. Production of multiply charged fullerene and carbon cluster beams by a 14.5 GHz ECR ion source
3. Production of multiply charged Si and Fe ions from solid materials by sputtering and evaporating methods in a 2.45 GHz ECR source
4. Y. Kato, S. Sugiyama, M. Miyata, and S. Ishii , Ion Implantation Technology-2002, IEEE Catalog Number 02EX432 (ISBN 0-7803-6462), 2003.
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