Production of multiply charged Si and Fe ions from solid materials by sputtering and evaporating methods in a 2.45 GHz ECR source
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1430862
Reference8 articles.
1. Sputtering‐assisted production of multicharged boron ions from solid material in a 2.45 GHz electron cyclotron resonance source
2. A silicon/iron-disilicide light-emitting diode operating at a wavelength of 1.5 μm
3. Metal ions from the volatile compounds method for the production of metal ion beams
4. Production of 3d metal ion electron cyclotron resonance plasmas and ion beams using volatile compounds
5. Metal ion production in ECRIS (invited)
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1. Production of multicharged metal ion beams on the first stage of tandem-type ECRIS;Review of Scientific Instruments;2016-02
2. An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources;Review of Scientific Instruments;2014-05
3. Improved efficiency and precise temperature control of low-frequency induction-heating pure iron vapor source on ECR ion source;AIP Conference Proceedings;2012
4. Induction heating pure vapor source of high temperature melting point materials on electron cyclotron resonance ion source;Review of Scientific Instruments;2010-02
5. Multicharged iron ions produced by using induction heating vapor source;Review of Scientific Instruments;2008
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