Formation of β-FeSi2 by implanting multicharged iron ions produced in an ECR ion source
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference9 articles.
1. Sputtering‐assisted production of multicharged boron ions from solid material in a 2.45 GHz electron cyclotron resonance source
2. Production of multiply charged Si and Fe ions from solid materials by sputtering and evaporating methods in a 2.45 GHz ECR source
3. Production of multicharged iron ions by using pyrolytic boron nitride crucible and application to material processing
4. A silicon/iron-disilicide light-emitting diode operating at a wavelength of 1.5 μm
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2. Production of multicharged metal ion beams on the first stage of tandem-type ECRIS;Review of Scientific Instruments;2016-02
3. Design of a new electron cyclotron resonance ion source at Oshima National College of Maritime Technology;Review of Scientific Instruments;2014-02
4. Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source;Surface and Coatings Technology;2013-08
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