Temperature induced differences in the nanostructure of hot-wire deposited silicon-germanium alloys analyzed by anomalous small-angle x-ray scattering-Reference-Cited by-同舟云学术

Temperature induced differences in the nanostructure of hot-wire deposited silicon-germanium alloys analyzed by anomalous small-angle x-ray scattering

Published:2006-04-15 Issue:8 Volume:99 Page:084309
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Goerigk G.,Williamson D. L.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2187088

Reference16 articles.

1. Nanostructure of a-Si:H and Related Materials by Small-Angle X-Ray Scattering

2. Nanostructured Ge distribution in a-SiGe : H alloys from anomalous small-angle X-ray scattering studies

3. Quantitative ASAXS of germanium inhomogeneities in amorphous silicon–germanium alloys

4. Comparative anomalous small-angle x-ray scattering study of hotwire and plasma grown amorphous silicon–germanium alloys

5. Mechanisms influencing “hot-wire” deposition of hydrogenated amorphous silicon

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