Electrical properties of n-type GaPN grown by molecular-beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2193350
Reference15 articles.
1. Optoelectronic Devices and Material Technologies for Photo-Electronic Integrated Systems
2. Dislocation-free and lattice-matched Si/GaP1−xNx/Si structure for photo-electronic integrated systems
3. Dislocation-free GaAsyP1−x−yNx/GaP0.98N0.02 quantum-well structure lattice- matched to a Si substrate
4. Increase in luminescence efficiency of GaPN layers by thermal annealing
5. Effects of nitrogen on the band structure of GaNxP1−x alloys
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1. Annealing and Hydrogenation of GaNP Lattice Matched to Si;2021 IEEE 48th Photovoltaic Specialists Conference (PVSC);2021-06-20
2. Doping control of GaAsPN alloys by molecular beam epitaxy for monolithic III-V/Si tandem solar cells;Journal of Crystal Growth;2017-09
3. Growth of a lattice-matched GaAsPN p–i–n junction on a Si substrate for monolithic III–V/Si tandem solar cells;Applied Physics Express;2017-06-20
4. Effect of boron localized states on the conduction band transport in BxGa1−xP;Applied Physics Letters;2014-12
5. Electrical and luminescence properties of Mg-doped p-type GaPN grown by molecular beam epitaxy;physica status solidi (c);2010-06-22
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