Amorphous SiN films grown by hot‐filament chemical vapor deposition using monomethylamine
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102622
Reference10 articles.
1. Some Properties of Vapor Deposited Silicon Nitride Films Using the SiH[sub 4]-NH[sub 3]-H[sub 2] System
2. Property Changes in Pyrolytic Silicon Nitride with Reactant Composition Changes
3. Ver low pressure pyrolysis. V. Benzylamine, N-methylbenzylamine, and N,N-dimethylbenzylamine and the heat of formation of the amino, methylamino, and dimethylamino radicals
4. Preparation and Properties of Pyrolytic Silicon Nitride
5. Properties of Hydrogenated Amorphous Si-N Prepared by Various Methods
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