Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference51 articles.
1. Chemical vapour deposition promoted by R.F. discharge;Sterling;Solid State Electr.,1965
2. Properties of amorphous silicon nitride films;Hu;J. Electrochem. Soc.,1966
3. a-Si:H produced by high-temperature thermal decomposition of silane;Wiesmann;J. Appl. Phys.,1979
4. Vapor deposition of diamond particles from methane;Matsumoto;Jpn. J. Appl. Phys.,1982
5. Hydro-fluorinated amorphous-silicon made by thermal CVD (Chemical Vapor Deposition) method;Matsumura,1985
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