Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.360263
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4. Effect of DC Bias Voltage on the Characteristics of Low Temperature Silicon–Nitride Films Deposited by Internal Linear Antenna Inductively Coupled Plasma Source;Japanese Journal of Applied Physics;2010-05-20
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