A comparative study on continuous and pulsed RF argon capacitive glow discharges at low pressure by fluid modeling
Author:
Funder
National Natural Science Foundation of China (NSFC)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4974762
Reference42 articles.
1. Advanced plasma sources for the future 450mm etch process
2. Plasma and ion sources in large area coating: A review
3. High-density plasma etching of compound semiconductors
4. Silicon etching in a pulsed HBr/O2 plasma. I. Ion flux and energy analysis
5. Gas discharge plasmas and their applications
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