A time-dependent model of pulse-driven radio frequency capacitively coupled collisional plasma sheath
Author:
Affiliation:
1. Department of Electrical and Electronic Engineering, East West University, Dhaka 1212, Bangladesh
2. Department of Electronics and Communications Engineering, East West University, Dhaka 1212, Bangladesh
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Reference41 articles.
1. Dual excitation reactive ion etcher for low energy plasma processing
2. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma
3. Analytical model of a dual frequency capacitive sheath
4. Modelling of the dual frequency capacitive sheath in the intermediate pressure range
5. A time-dependent analytical sheath model for dual-frequency capacitively coupled plasma
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2. A Time-Dependent Model of Pulse-Modulated Dual Radio Frequency Capacitively Coupled Plasma Sheath;Plasma Physics Reports;2021-10
3. Optical emission intensity overshoot and electron heating mechanisms during the re-ignition of pulsed capacitively coupled Ar plasmas;Journal of Vacuum Science & Technology B;2021-03
4. Electron dynamics during the reignition of pulsed capacitively-coupled radio-frequency discharges;Journal of Vacuum Science & Technology B;2020-05
5. Diagnosis of capacitively coupled plasma driven by pulse-modulated 27.12 MHz by using an emissive probe;Acta Physica Sinica;2020
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