CF2kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

Author:

Tserepi A. D.,Derouard J.,Booth J. P.,Sadeghi N.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 38 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Detection of OH radicals in atmospheric-pressure plasma jet by evanescent-wave laser-induced fluorescence spectroscopy;Journal of Instrumentation;2019-11-18

2. Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-05

3. Gain and loss mechanisms for neutral species in low pressure fluorocarbon plasmas by infrared spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-09

4. Analysis and Modeling of Gas-Phase Processes in a CHF3 /Ar Discharge;Plasma Processes and Polymers;2011-03-25

5. Chemistry in long residence time fluorocarbon plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-03

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