Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3647779
Reference27 articles.
1. J. S. Taylor and R. Soufli, in EUV Lithography, edited by V. Bakshi (SPIE and John Wiley & Sons, Inc. Bellingham, WA/Hoboken, NJ, 2009), p–188.
2. Physical processes in EUV sources for microlithography
3. The effect of excitation wavelength on dynamics of laser-produced tin plasma
4. Combined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modeling
5. EUV Sources for Lithography
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