Intrinsic and extrinsic diffusion of phosphorus, arsenic, and antimony in germanium
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2837103
Reference36 articles.
1. Activation and diffusion studies of ion-implanted p and n dopants in germanium
2. Diffusion, activation, and recrystallization of boron implanted in preamorphized and crystalline germanium
3. Diffusion of boron in germanium at 800–900°C
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