Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4733701
Reference38 articles.
1. Surface passivation of crystalline silicon solar cells: a review
2. The silane depletion fraction as an indicator for the amorphous/crystalline silicon interface passivation quality
3. Surface recombination velocity of phosphorus-diffused silicon solar cell emitters passivated with plasma enhanced chemical vapor deposited silicon nitride and thermal silicon oxide
4. Very low bulk and surface recombination in oxidized silicon wafers
5. Surface passivation ofn-type crystalline Si by plasma-enhanced-chemical-vapor-deposited amorphous SiCx:H and amorphous SiCxNy:H films
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