A simple model for the etching of photoresist with plasma‐generated reactants
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352037
Reference21 articles.
1. Oxygen plasma etching for resist stripping and multilayer lithography
2. Plasma etching and modification of organic polymers
3. Anomalous etch rates of photoresist with argon dilution of CF4/O2plasma afterglows
4. Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing
5. Resist stripping in an O2+H2O plasma downstream
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