Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing-Reference-Cited by-同舟云学术

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Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing

Published:1990-10-20 Issue:Part 1, No. 10 Volume:29 Page:2165-2170
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Fujimura Shuzo,Shinagawa Keisuke,Nakamura Moritaka,Yano Hiroshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 37 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF₃ mixtures;Journal of Physics D: Applied Physics;2024-08-02

2. Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma;Nanomaterials;2022-10-27

3. Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O2 mixture gases;Journal of Physics D: Applied Physics;2019-07-03

4. Degradation of Poly(acrylic acid) in Aqueous Solution by Using O₃ Microbubble;Journal of Photopolymer Science and Technology;2018-06-25

5. Polymer etching by atmospheric‐pressure plasma jet and surface micro‐discharge sources: Activation energy analysis and etching directionality;Plasma Processes and Polymers;2018-03-05

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