Temporal intensity modulation of spectral lines in a low‐frequency discharge in argon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.341366
Reference19 articles.
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3. Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers
4. Ion response to plasma excitation frequency
5. Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system
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1. Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching;Applied Surface Science;2002-05
2. Temporally and spatially resolved plasma parameters and EEDF measurements in a low-frequency discharge;Plasma Sources Science and Technology;1995-11-01
3. Time-dependent kinetics of electrons and 3p54s levels of argon in high frequency plasmas;Journal of Physics D: Applied Physics;1994-06-14
4. Electric current oscillations in a parallel‐plate plasma reactor;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-05
5. Spatiotemporal optical emission spectroscopy of rf discharges in SF6;Journal of Applied Physics;1993-03
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