Effects of frequency on optical emission, electrical, ion, and etching characteristics of a radio frequency chlorine plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.335978
Reference30 articles.
1. The design of plasma etchants
2. Basic chemistry and mechanisms of plasma etching
3. Frequency Effect on Material Selectivity in Gas Plasma Etching in Planar Type Reactor
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