Ultrathin zirconium silicate film with good thermal stability for alternative gate dielectric application
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1308535
Reference8 articles.
1. Stable zirconium silicate gate dielectrics deposited directly on silicon
2. Hafnium and zirconium silicates for advanced gate dielectrics
3. Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon
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