Stress evolution during and after sputter deposition of Cu thin films onto Si (100) substrates under various sputtering pressures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1858062
Reference34 articles.
1. A simple technique to measure stress in ultrathin films during growth
2. Optical deflection setup for stress measurements in thin films
3. A UHV‐compatible thin‐film stress‐measuring apparatus based on the cantilever beam principle
4. Intrinsic Stress in Evaporated Metal Films
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