Quantum chemical study of the elementary reactions in zirconium oxide atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1490415
Reference11 articles.
1. Scaling the gate dielectric: Materials, integration, and reliability
2. Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor
3. Surface Chemistry for Atomic Layer Growth
4. A new mixing of Hartree–Fock and local density‐functional theories
5. Ab initio effective core potentials for molecular calculations. Potentials for main group elements Na to Bi
Cited by 56 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electrochemical Behavior of Tetraethylammonium-Hydrogen Sulfate-Based Electrodissolution-Coupled Hafnium Alkoxide Synthesis;JOM;2022-07-07
2. Density functional theory study on the reducing agents for atomic layer deposition of tungsten using tungsten chloride precursor;Applied Surface Science;2021-02
3. Speeding up the unique assets of atomic layer deposition;Materials Today Chemistry;2019-06
4. Real-Time X-ray Photoemission Spectroscopy Study of Si(001)-2×1 Exposed to Water Vapor: Adsorption Kinetics, Fermi Level Positioning, and Electron Affinity Variations;The Journal of Physical Chemistry C;2016-09-09
5. Gas–surface reactions in the growth of dielectric films by chemical vapor deposition: The role of nonequilibrium surface diffusion of adsorbed precursors;Russian Journal of Physical Chemistry B;2016-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3