Overview of Mask Metrology-Reference-Cited by-同舟云学术

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Overview of Mask Metrology

Published:2011 Issue: Volume: Page:
ISSN:0094-243X
Container-title:AIP Conference Proceedings
language:
Short-container-title:

Author:

Rice Bryan J.,Jindal Vibhu,Lin C. C.,Harris-Jones Jenah,Kwon Hyuk Joo,Ma Hsing-Chien,Goldstein Michael,Chan Yau-Wai,Goodwin Frank,Seiler David G.,Diebold Alain C.,McDonald Robert,Chabli Amal,Secula Erik M.

Publisher

AIP

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on defocus image-based template matching algorithm for extreme ultraviolet mask phase defect detection;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

2. Phase defect detection algorithm for extreme ultraviolet mask blank based on watershed edge detection;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

3. A Survey Describing Beyond Si Transistors and Exploring Their Implications for Future Processors;ACM Journal on Emerging Technologies in Computing Systems;2021-06-25

4. Automated mask and wafer defect classification using a novel method for generalized CD variation measurements;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-13

5. Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01

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