Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique-Reference-Cited by-同舟云学术

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Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique

Published:2013-04-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography IV
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Author:

Jindal V.,John A.,Harris-Jones J.,Kearney P.,Antohe A.,Stinzianni E.,Goodwin F.,Onoue T.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature;Nanotechnology;2024-02-27

2. EUV mask defect material characterization through actinic lensless imaging;Metrology, Inspection, and Process Control XXXVI;2022-05-26

3. High speed low power optical detection of sub-wavelength scatterer;Review of Scientific Instruments;2015-12

4. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-05-15

5. Actinic review of EUV masks: Status and recent results of the AIMS EUV system;SPIE Proceedings;2015-03-16

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