Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach-Reference-Cited by-同舟云学术

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Published:2015-05-15 Issue:2 Volume:14 Page:023505
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Upadhyaya Mihir¹,Jindal Vibhu²,Basavalingappa Adarsh¹,Herbol Henry¹,Harris-Jones Jenah³,Jang Il-Yong⁴,Goldberg Kenneth A.⁵,Mochi Iacopo⁵,Marokkey Sajan⁶,Demmerle Wolfgang⁶,Pistor Thomas V.⁷,Denbeaux Gregory¹

Affiliation:

1. State University of New York, College of Nanoscale Science and Engineering, 255 Fuller Road, Albany, New York 12203, United States

2. SEMATECH, 257 Fuller Road, Albany, New York 12203, United States

3. Global Foundries, 400 Stone Break Extension, Malta, New York 12020, United States

4. Samsung Electronics Co., 129 Samsung-ro Suwon-Si, Gyeonggi-Do 443-742, Republic of Korea

5. Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

6. Synopsys, 700 East Middlefield Road, Mountain View, California 94043, United States

7. Panoramic Technology Inc., 1221 Balboa Avenue, Burlingame, California 94010, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography;Advanced Optical Technologies;2017-01-01

2. Toward defect-free fabrication of extreme ultraviolet photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-04-12

3. Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-18