Author:
Kris Roman,Cohen Boaz,Verechagin Vadim,Schwarzband Ishai,Shkalim Ariel,Bal Evgeny,Price Dan,Milstein Adi,Levy Shimon
Reference9 articles.
1. B. J. Rice, V. Jindal, C. C. Lin, J. Harris-Jones, H. Kwon, A. Ma, M. Goldstein, F. Goodwin, “Overview of EUV Mask Metrology”, https://www.nist.gov/sites/default/files/documents/pml/div683/conference/Rice_2011.pdf.
2. Accurate and Repeatable Mask Defect Measurement for. 25 Micron Technology;Fiekowsky,1997
3. Specifying and Measuring Photomask Critical Dimensions;Mack,1999
4. WLCD: A new System for Wafer Level CD Metrology on Photomasks;Martin,2009
5. Mask CD Uniformity Metrology for Logic Patterning and its Correlation to Wafer Data;Gratiet,2012