Global model and scaling laws for inductively coupled oxygen discharge plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371255
Reference20 articles.
1. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges
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4. Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching
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