Polymer-based X-ray masks patterned by direct laser writing-Reference-Cited by-同舟云学术

Polymer-based X-ray masks patterned by direct laser writing

Published:2018-11 Issue:11 Volume:89 Page:115001
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Achenbach Sven¹^ORCID,Wells Garth²,Jacobs Michael¹²,Moazed Banafsheh¹,Iyer Swathi¹,Hanson Jack¹

Affiliation:

1. Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, Saskatchewan S7N 5A9, Canada

2. Synchrotron Laboratory for Micro and Nano Devices (SyLMAND), Canadian Light Source, Inc., 44 Innovation Boulevard, Saskatoon, Saskatchewan S7N 2V3, Canada

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5041916

Reference26 articles.

1. Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)

2. Micro-optical and optomechanical systems fabricated by the LIGA technique

3. Vertical High-$Q$ RF-MEMS Devices for Reactive Lumped-Element Circuits

4. Launching into a golden age: gears (mm parts) made by the deep X-ray LIG(A) process

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