Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332763
Reference23 articles.
1. The design of plasma etchants
2. Plasma etching of sputtered Mo and MoSi2thin films in NF3gas mixtures
3. Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
4. Polysilicon etching and profile control in a CCl4–O2 plasma
5. Carbon tetrachloride plasma etching of GaAs and InP: A kinetic study utilizing nonperturbative optical techniques
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